|
|
Beamline 7.3.1
|
|
 o
|
|
Source
|
Bending magnet.
|
|
Energy range
|
200-1300 eV.
|
|
Energy resolution E/DE
|
1000-1600 (depending on slit size).
|
|
Polarization
|
linearly, left and right elliptically polarized
(~75%).
|
|
| Type |
Photoemission Electron Microscopy. |
| Spatial resolution |
50-100 nm. |
| Capabilities |
Sample environment: Room temperature to 900K, pulsed magnetic fields,
electrical connections.
Sample preparation: UHV evaporation and sputter evaporation, surface
analysis tools.
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|
Endstation 2: XMCD chamber
| Type |
XMCD spectroscopy. |
| Magnetic field |
800 Gauss parallel x-rays. |
|
Beamline 11.0.1
|
| |
|
Source
|
5 cm period elliptically polarizing undulator (EPU).
|
|
Energy range
|
100–2000 eV.
|
|
Energy resolution E/DE
|
4000 (depending on slit size).
|
|
Polarization
|
full polarization control, from linear horizontal
to vertical, left and right elliptically polarized (~80%).
|
|
| Type |
Photoemission Electron Microscopy. |
| Spatial resolution |
50-100 nm, 5 nm after aberration correction. |
| Capabilities |
Sample environment: 60 K - 900 K, electrical connections.
Sample preparation (2008): UHV evaporation and sputter evaporation,
surface analysis tools.
|
|
Endstation 2: 6-degree chamber with
streak camera detector
| Type |
time-resolved XMCD spectroscopy (transmission). |
| Temporal resolution |
1-2 picoseconds. |
| Magnetic field |
500 Gauss paralel and perpendicular x-rays. |
|
|
